Docomomo US/Hawai'i and AIA Honolulu are co-hosting a talk story presentation by Adam Štěch at the Center for Architecture in Honolulu. Prague-based architecture and design writer, curator, and researcher, Adam Štěch, will present his various exhibition and publishing projects, covering 20th century modernism.
For 15 years, Adam traveled extensively to document hidden and forgotten gems of 20th century architecture and design. This research was then used as content for articles in international magazines and exhibition projects, usually created with his colleagues from OKOLO creative collective, founded in Prague in 2009. At this event, he will share some of his most exciting adventures and discoveries from all around the world and his creative process.
Drinks will be available by donation at the Center for Architecture.
Adam Štěch (1986 Děčín) has long been involved in design, architecture and visual arts as a theorist, journalist and curator. He studied art history at Charles University in Prague and since 2009 has been working as an editor for Dolce Vita magazine. He is a co-founder of the creative group OKOLO, with which he has prepared dozens of publication and exhibition projects in the Czech Republic and abroad since 2009. He is also the author of a number of texts on design and architecture that have been published in the Czech and foreign press, including: Wallpaper, Modernism, Damn, Cool Hunting, Domus, Architonic, Mark, Frame, A10 and SightUnseen. He has also collaborated with brands and institutions such as Phillips de Pury, Casa Mollino, Gubi, Tolix, Design Museum Holon, Victoria & Albert Museum, Vitra Design Museum, Triennale di Milano, Depot Basel, Brompton Design District, Vienna Design Week, Maharam, Phaidon and next. He lectures at Scholastika in Prague and FUD in Ústí nad Labem. He is the author of Inside Utopia, published by Berlin-based Gestalten in 2017, as well as Modern Architecture and Interiors for Prestel (2020). Click here to see his highly curated Instagram profile.
Free to register; please select in-person or virtual attendance during registration.
